Steve Putna

Associate Vice Chancellor for Research
Director of the Texas A&M Semiconductor Institute at the Texas A&M University System
Professor of Practice in Chemical Engineering

Educational Background

B.S. in Chemical Engineering (with Honors), University of Texas at Austin — 1993
M.S.E. in Chemical Engineering, University of Pennsylvania — 1995
Ph.D. in Chemical Engineering, University of Pennsylvania — 1998

Nyhus, Paul A., Eungnak Han, Swaminathan Sivakumar, and Ernisse S. Putna. "Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging." — 2019
Younkin, Todd R., Michael J. Leeson, James M. Blackwell, Ernisse S. Putna, Marie Krysak, Rami Hourani, Eungnak Han, and Robert L. Bristol. "Photodefinable alignment layer for chemical assisted patterning." — 2017
Koveshnikov, Sergei V., Juan E. Dominguez, Kyle Y. Flanigan, and Ernisse Putna. "Optical coatings." — 2010
Meagley, Robert P., Ernisse S. Putna, and Wang Yueh. "Methods and compositions for providing photoresist with improved properties for contacting liquids." — 2010

O’Brien, Kevin P., Carl H. Naylor, Chelsey Dorow, Kirby Maxey, Ashish Verma Penumatcha, Andrey Vyatskikh, Ting Zhong et al. "Process integration and future outlook of 2D transistors." Nature Communications 14, no. 1 (2023): 6400.
Krysak, Marie E., James M. Blackwell, Steve E. Putna, Michael J. Leeson, Todd R. Younkin, Shane Harlson, Kent Frasure, and Florian Gstrein. "Investigation of novel inorganic resist materials for EUV lithography." Extreme Ultraviolet (EUV) Lithography V 9048 (2014): 11-17.
Putna, E. Steve, Todd R. Younkin, Michael Leeson, Roman Caudillo, Terence Bacuita, Uday Shah, and Manish Chandhok. "EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs." Extreme Ultraviolet (EUV) Lithography II 7969 (2011): 816-824.
Vandentop, Gilroy J., E. Steve Putna, Michael J. Leeson, Todd R. Younkin, Grant M. Kloster, Uday Shah, and Manish Chandhok. "EUV resist testing status and post lithography LWR reduction." Journal of Photopolymer Science and Technology 24, no. 2 (2011): 127-136.