• Professor, Chemical Engineering
  • Phone: 979.845.9807
  • FAX: 979.458.8836
  • Email: yuekuo@tamu.edu
  • Office: CHEN 235
Yue Kuo

Educational Background

  • B.S. (1974) National Taiwan University, Taipei, Taiwan
  • M.S. (1978) Columbia University, NYC
  • Dr. Eng. Sci. (1979) Columbia University, NYC

Research Interests

    • 2-Mask, Self-aligned, Tri-layer TFT
    • Graded Gate Dielectric TFT
    • Vertically Redundant TFT
    • Horizontally Redundant TFT
    • Thin Film Transistors (TFTs)
    • Nanocrystals Embedded Nonvolatile Memories
    • Floating-gate a-Si:H TFT Nonvolatile Memories
    • Light Emitting Devices
    • Thin Film Solar Cells
    • Biochips
    • Applications in VLSI, LCD, Sensor

Awards & Honors

  • ECS Electronics and Photonics Division Award 2007
  • IEEE Fellow
  • Distinguished Achievement in Research Award, TAMU Association of Former Students 2012

Selected Publications

  • C.-C. Lin and Y. Kuo, “Temperature Effects on Nanocrystalline Molybdenum Oxide Embedded ZrHfO High-k Nonvolatile Memory Functions,” ECS J. Solid State Sci. Technol., 2(1) Q16-Q22 (2013).
  • Y. Kuo and C.-C. Lin*, “Crystallization of a-Si Thin Film Using an Ultra Thin n+ Poly-Si Seed Layer for Solar Cell Applications,” IEEE 38th Photovoltaic Specialist Conf. PVSC, 000342-000345 (2012).
  • X. Liu, C.-H. Yang, Y. Kuo, and T. Yuan, “Memory Functions of Molybdenum Oxide Embedded ZrHfO High-k,” Electrochem. Solid-State Letters, 15 (6) H1-H3 (2012).
  • C.-C. Lin and Y. Kuo, “Plasma etching of copper thin film over a dielectric step and electromigration failure mechanism,” 2012 MRS Proc. Symp. C: Interconnect Challenges for CMOS Technology, 1428, mrss12-1428-c05-03 (2012). Doi:10.1557/opl.2012.1313.
  • S.-H. Wu, Y. Kuo, and C.-C. Lin, “Light wavelength effects on the performance of a-Si:H PIN photodiode,” 2112 MRS Proc. Symp. A: Amorphous and Polycrystalline Thin-Film Silicon Science and Technology, 1426, 199-204 (2012).
  • Y. Kuo and C.-C. Lin, “Polycrystalline Silicon Thin Films Formed by Multiple Pulsed Rapid Thermal Annealing,” MRS Proc. Symp. A: Amorphous and Polycrystalline Thin-Film Silicon Science and Technology, 1426, 269-274 (2012).
  • Y. Kuo, X. Liu*, C.-H. Yang*, and C.-C. Lin*, “Nonvolatile Memory Characteristics of Molybdenum Oxide Embedded High-k Film - Performance and Light Wavelength Effects,” 2112 MRS Proc. Symp. E: Materials And Physics of Emerging Nonvolatile Memories, 1430, 21-27 (2012).
  • C.-C. Lin and Y. Kuo, “Step effect on Cl2 plasma-based copper etch process,” J. Vac. Sci. Technol. B, 30(2) 021204-1 (2012).
  • C.-C. Lin and Y. Kuo, “Failure mechanism of electromigration of copper interconnections deposited on topographic steps with a plasma-based etch process,” J. Appl. Phys., 111, 064909 (2012). This paper was selected as a Research Hights & News from J. Appl. Phys. April 19, 2012.
  • A. Birge and Y. Kuo, “Memory Functions of Nanocrystalline ITO Embedded Zirconium-Doped Hafnium Oxide High-k Capacitor with ITO Gate,” J. Electrochem. Soc., 159(6) H595-H598 (2012).