Yue Kuo

Professor, Chemical Engineering


Office: CHEN 235
Phone: 979.845.9807
Fax: 979.458.8836
Email: yuekuo@tamu.edu

Google Scholar Profile

Research Interests

  • 2-Mask, Self-aligned, Tri-layer TFT
  • Graded Gate Dielectric TFT
  • Vertically Redundant TFT
  • Horizontally Redundant TFT
  • Thin Film Transistors (TFTs)
  • Nanocrystals Embedded Nonvolatile Memories
  • Floating-gate a-Si:H TFT Nonvolatile Memories
  • Light Emitting Devices
  • Thin Film Solar Cells
  • Biochips
  • Applications in VLSI, LCD, Sensor

Awards & Honors

  • ECS Electronics and Photonics Division Award 2007
  • IEEE Fellow
  • Distinguished Achievement in Research Award, TAMU Association of Former Students 2012


  • B.S. (1974) National Taiwan University, Taipei, Taiwan
  • M.S. (1978) Columbia University, NYC
  • Dr. Eng. Sci. (1979) Columbia University, NYC

Selected Publications

C.-C. Lin and Y. Kuo, “Temperature Effects on Nanocrystalline Molybdenum Oxide Embedded ZrHfO High-k Nonvolatile Memory Functions,” ECS J. Solid State Sci. Technol., 2(1) Q16-Q22 (2013).

Y. Kuo and C.-C. Lin*, “Crystallization of a-Si Thin Film Using an Ultra Thin n+ Poly-Si Seed Layer for Solar Cell Applications,” IEEE 38th Photovoltaic Specialist Conf. PVSC, 000342-000345 (2012).

X. Liu, C.-H. Yang, Y. Kuo, and T. Yuan, “Memory Functions of Molybdenum Oxide Embedded ZrHfO High-k,” Electrochem. Solid-State Letters, 15 (6) H1-H3 (2012).

C.-C. Lin and Y. Kuo, “Plasma etching of copper thin film over a dielectric step and electromigration failure mechanism,” 2012 MRS Proc. Symp. C: Interconnect Challenges for CMOS Technology, 1428, mrss12-1428-c05-03 (2012). Doi:10.1557/opl.2012.1313.

S.-H. Wu, Y. Kuo, and C.-C. Lin, “Light wavelength effects on the performance of a-Si:H PIN photodiode,” 2112 MRS Proc. Symp. A: Amorphous and Polycrystalline Thin-Film Silicon Science and Technology, 1426, 199-204 (2012).

Y. Kuo and C.-C. Lin, “Polycrystalline Silicon Thin Films Formed by Multiple Pulsed Rapid Thermal Annealing,” MRS Proc. Symp. A: Amorphous and Polycrystalline Thin-Film Silicon Science and Technology, 1426, 269-274 (2012).

Y. Kuo, X. Liu*, C.-H. Yang*, and C.-C. Lin*, “Nonvolatile Memory Characteristics of Molybdenum Oxide Embedded High-k Film - Performance and Light Wavelength Effects,” 2112 MRS Proc. Symp. E: Materials And Physics of Emerging Nonvolatile Memories, 1430, 21-27 (2012).

C.-C. Lin and Y. Kuo, “Step effect on Cl2 plasma-based copper etch process,” J. Vac. Sci. Technol. B, 30(2) 021204-1 (2012).

C.-C. Lin and Y. Kuo, “Failure mechanism of electromigration of copper interconnections deposited on topographic steps with a plasma-based etch process,” J. Appl. Phys., 111, 064909 (2012). This paper was selected as a Research Hights & News from J. Appl. Phys. April 19, 2012.

A. Birge and Y. Kuo, “Memory Functions of Nanocrystalline ITO Embedded Zirconium-Doped Hafnium Oxide High-k Capacitor with ITO Gate,” J. Electrochem. Soc., 159(6) H595-H598 (2012).